HIP-XJP-607工业冶金显微镜的开发和目标是半导体工业，晶圆制造，电子信息产业，冶金工业。 作为一种先进的冶金显微镜，用户在使用时可以体验到它的超强性能。它可以广泛用于识别和分析半导体，FPD，电路封装，电路基板，材料，铸造/金属/陶瓷零件，精密模具和观察 较厚的标本。 高质量和可靠的光学系统带来更清晰和对比度的图像。 该设计符合人体工程学的需求，让您在工作中感到舒适和放松。

Specification
Viewing Head	Compensation Free Trinocular Head, Inclined 30°(50mm-75mm)
Eyepiece	WF10×/25mm
	WF10×/20mm,crosshair with reticule 0.1mm
Objective	Long working distance bright and dark field Infinite Plan objectives: 5 ×/0.1B.D/W.D.29.4mm 10×/0.25B.D/W.D.16mm  20×/0.40B.D/W.D.10.6mm 40 ×/0.60B.D/W.D.5.4mm
Nosepiece	Quintuple Nosepiece with DIC Jack
Stage	Double layer mechanical stage
	Stage Size: 190mm×140mm
	Moving Range:50mm×40mm
Filter	Flashboard type filters(green,blue,neutral)
Focusing	Coaxial coarse &fine focusing adjustment With rack and pinion mechanism Fine focusing scale value 0.002mm
Light Source	With aperture iris diaphragm and field iris diaphragm, halogen Bulb 12V/50W,  AC85V-230 Brightness Adjustable
Polarizing Device	Analyzer rotatable 360,°Polarizer&Analyzer can be moved in/out of the optical path
Checking Tool	0.01mm Micrometer
Optional Accessory	Two-dimensional measurement software
	Professional metallurgical image analysis software
	Halogen Bulb 12V/100W
	Micrometer eyepiece
	1.3Mega,2.0 Mega,3.0 Mega,5.0 Mega pixels CMOS Digital camera eyepieces
	Long working distance bright & dark field Infinite Plan objectives: 50 ×/0.55B.D/W.D.5.1mm, 80×/0.75B.D/W.D.4mm,100×/0.80B.D/W.D.3mm
	Precision Stage:X-Y moving range 25mm×25mm,Moving Precision<5um,Digital hand wheel Min.Value:0.1um,360°Rotatable disc
	Photography attachment and CCD Adapter 0.5×,0.57×,0.75×
	DIC(10×,20×,40×,100×)
	Planishing tool
	CCD Camera,colour 1/3″High resolution 520 TV lines

特征和描述
 
1. UIS无限光学系统。

2.采用长寿命卤素光源，光效更高。

3.明场和暗场，偏振和差分干涉功能。

4.非球面科勒照明，增加观察亮度。

5. WF10×（Φ25）超宽视场目镜，工作距离长

           冶金目标与明亮和黑暗的领域

6.五元件Nosepiece可配备可拆卸的DIC差速器
           干扰装置。
 
DIC：Nomarski差分干涉对比度观察被认为是检查材料，半导体和金属结构的必要手段。